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Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices

  • Book
  • © 1993

Overview

Editors:
  1. Orlando Auciello

    1. MCNC, Center for Microelectronics, System Technologies, Research Triangle Park, USA

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    You can also search for this editor in PubMed   Google Scholar

  2. Jürgen Engemann

    1. Microstructure Research Center, University of Wuppertal, Wuppertal, Germany

    View editor publications

    You can also search for this editor in PubMed   Google Scholar

Part of the book series: NATO Science Series E: (NSSE, volume 234)

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Table of contents (37 chapters)

  1. Front Matter

    Pages i-xv
    Download chapter PDF

  2. Plasma Sputter Deposition Systems: Plasma Generation, Basic Physics and Characterization

    • S. M. Rossnagel
    Pages 1-20

  3. Technology and Application of Filamentless RF — Ion Sources in Ion Beam Sputter Deposition

    • J. Engemann
    Pages 21-38

  4. Physics of Film Growth from the Vapor Phase

    • J. E. Greene
    Pages 39-85

  5. Techniques for the Growth of Crystalline Films by Molecular Beam Deposition

    • J. C. Bean
    Pages 87-107

  6. Discharge Density Increase for High Rate Magnetron Sputtering

    • W. M. Posadowski
    Pages 109-113

  7. On the Transport of Sputtered Species in Plasma Sputter-Deposition Systems

    • J. C. Moreno-Marin, A. Gras-Marti, O. Auciello
    Pages 115-120

  8. Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering

    • V. Teixeira, M. Andritschky
    Pages 121-127

  9. Sputter Deposition of Multicomponent Targets: What Parts of the Process Affect the Elemental Composition of the Film

    • D. Theirich
    Pages 129-134

  10. A Proposition of a Novel Reactive Sputter-Deposition System for Synthesizing Multi-Component Materials

    • S. Maniv
    Pages 135-140

  11. The Influence of Precursors on the Preparation of Thin Pyrite Films by Metal Organic Chemical Vapor Deposition

    • C. Höpfner, A. Ennaoui, K. Ellmer, S. Fiechter
    Pages 141-144

  12. Modelling of the Intrinsic Stress in PVD-Coatings

    • M. Andritschky, V. Teixeira
    Pages 145-149

  13. Physical Vapor Deposition of Multicomponent Oxide Thin Films: Techniques, Basic Deposition Processes and Film Processing-Microstructure-Property Relationships

    • O. Auciello, A. I. Kingon, A. R. Krauss, D. J. Lichtenwalner
    Pages 151-208

  14. Pulsed Laser Deposited Metal-Oxide Based Superconductor, Semiconductor and Dielectric Heterostructures and Superlattices

    • T. Venkatesan, S. Bhattacharya, C. Doughty, A. Findikoglu, C. Kwon, Qi Li et al.
    Pages 209-238

  15. Synthesis of Optical Thin Films: Fundamentals and Applications

    • R. P. Howson
    Pages 239-249

  16. Ion Beam-Based Characterization of Multicomponent Oxide Thin Films and Thin Film Layered Structures

    • A. R. Krauss, M. Rangaswamy, Y. Lin, D. M. Gruen, J. A. Schultz, H. K. Schmidt et al.
    Pages 251-281

  17. Electron Spectroscopic Analysis of Multicomponent Thin Films with Particular Emphasis on Oxides

    • T. L. Barr
    Pages 283-309

  18. Transmission Electron Microscopy of Oxide Thin Films

    • R. Ramesh
    Pages 311-355

  19. Laser Deposition of HTSC Films: Expansion of the Laser Plasma, Deposition of Particles, Formation of the Crystal Structure and Superconducting Properties of Films

    • M. R. Predtechensky
    Pages 357-367

  20. YBaCuO Films by Pulsed Laser Deposition and Sputtering

    • T. Koga, J. H. Xu, B. M. Moon, K. V. Rao
    Pages 369-374
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Keywords

About this book

The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices.
This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films.
The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.

Editors and Affiliations

  • MCNC, Center for Microelectronics, System Technologies, Research Triangle Park, USA

    Orlando Auciello

  • Microstructure Research Center, University of Wuppertal, Wuppertal, Germany

    Jürgen Engemann

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