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Erosion and Growth of Solids Stimulated by Atom and Ion Beams

  • Book
  • © 1986

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Editors:
  1. G. Kiriakidis

    1. Physics Department, University of Crete, Heraklion, Crete, Greece

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  2. G. Carter

    1. Department of Electronic and Electrical Engineering, University of Salford, Salford, UK

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  3. J. L. Whitton

    1. Physics Department, Queen’s University, Kingston, Canada

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Part of the book series: NATO Science Series E: (NSSE, volume 112)

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Table of contents (31 chapters)

  1. Front Matter

    Pages I-XI
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  2. Physical Sputtering of Elemental Metals and Semiconductors

    • Wolfgang O. Hofer
    Pages 1-24

  3. Ion Implantation Mechanisms and Related Computational Issues

    • Omer F. Goktepe
    Pages 25-40

  4. The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation

    • Roger Kelly, Antonino Oliva
    Pages 41-69

  5. Theory of Surface Erosion and Growth

    • G Carter
    Pages 70-97

  6. On the Composition of the Sputtered Flux from Metal Targets and their Compounds

    • G. Betz, W. Husinsky
    Pages 98-102

  7. Geometric Methods of Analysis

    • M. J. Nobes
    Pages 103-120

  8. Surface Topographical Evolution: Computational Methods of Analysis

    • R. Smith, M. A. Tagg
    Pages 121-145

  9. Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer

    • B. Baretzky, E. Taglauer
    Pages 146-150

  10. Experimental Studies of Morphology Development

    • J. L. Whitton
    Pages 151-173

  11. Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Structures

    • L. Tanovic, N. Tanovic, A. Zalar
    Pages 174-180

  12. Effects of Surface Impurities and Diffusion on Ion Bombardment-Induced Topography Formation

    • Stephen M. Rossnagel
    Pages 181-199

  13. Ion Trapping and Cluster Growth

    • A. Van Veen
    Pages 200-221

  14. Bubbles, Blisters, and Exfoliation

    • B. M. U. Scherzer
    Pages 222-246

  15. Examples of Ion Bombardment Effects On Film Growth and Erosion Processes — Plasma and Beam Experiments

    • Eric Kay
    Pages 247-274

  16. On The Modification of Metal/Ceramic Interfaces by Low Energy Ion/Atom Bombardment During Film Growth

    • J. M. Rigsbee, P. A. Scott, R. K. Knipe, V. F. Hock
    Pages 275-280

  17. Plasma Etching for Silicon Device Technology

    • C. J. Heslop
    Pages 281-296

  18. Reactive Ion Etching of GaAs and Related III-V Compounds

    • Steven Dzioba
    Pages 297-315

  19. Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification

    • L. Calliari, F. Giacomozzi, L. Guzman, B. Margesin, P. M. Ossi
    Pages 316-323

  20. Molecular Beam Epitaxy And Selective MBE Deposition of GaAs Device Structures

    • A. Christou
    Pages 324-337
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Keywords

About this book

The members of the organising Committee and their colleagues have, for many years been investigating the evol­ ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho­ graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.

Editors and Affiliations

  • Physics Department, University of Crete, Heraklion, Crete, Greece

    G. Kiriakidis

  • Department of Electronic and Electrical Engineering, University of Salford, Salford, UK

    G. Carter

  • Physics Department, Queen’s University, Kingston, Canada

    J. L. Whitton

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